SE-Mapping Spectral Ellipsometer Introduction: SE-Mapping Spectral Ellipsometer is a customizable Mapping Graphical Spectroscopic Ellipsometer. It adopts the industry's cutting-edge innovation technology and is equipped with a fully automatic Mapping measurement module. It is fast through the measurement of parameters such as ellipsometric parameters and transmission/reflectivity. Achieve thin film full substrate film thickness and optical parameter custom mapping measurement characterization analysis. Features: 1. Full substrate ellipsometric drawing measurement solution 2. Support product design and customization of function modules, one-button drawing measurement 3. High precision, fully automatic optical ellipsometry solution 4. Fully automatic variable angle focusing technology, easy to use, one button quick measurement 5. Wizard interactive human-machine interface, convenient software operation experience 6. Configure the Mapping module to fully customize the multi-point positioning measurement capability of the entire substrate. 7. Rich material database and algorithm model library, powerful data analysis capabilities 8, hundreds of material databases, a variety of algorithm model library, covering most of the current photovoltaic materials Technical Parameters: Degree of automation: fixed angle Application positioning: detection type Basic functions: Psi/Delta, N/C/S, R, etc. Analytical spectrum: 380-1000nm (expandable to 193-2500nm) Single measurement time: 0.5-5s Repeatability measurement accuracy: 0.01nm Spot size: large spot 2-3mm, micro spot 200um Angle of incidence adjustment: fixed angle Angle of incidence: 65° Focusing method: manual focus Mapping1: 300x300mm Support sample size: * up to 300mm
Introduction: SE-Mapping Spectral Ellipsometer is a customizable Mapping Graphical Spectroscopic Ellipsometer. It adopts the industry's cutting-edge innovation technology and is equipped with a fully automatic Mapping measurement module. It is fast through the measurement of parameters such as ellipsometric parameters and transmission/reflectivity. Achieve thin film full substrate film thickness and optical parameter custom mapping measurement characterization analysis.
