Introduction: EM12 is the extension of measuring technology of advanced technology, sophisticated type for research and development and quality control in the field of precision end needs of the launch of multi angle laser ellipsometer. EM12 can accurately measure the samples in a single incident angle or multi angle. Can be used for film thickness measurement of monolayer or multilayer nano film samples. The refractive index and extinction coefficient of N K; also can be used for simultaneous measurement of refractive index of bulk material ratio n and extinction coefficient K; can be used for real-time measurement of thickness of nanometer thin film growth in dynamic film thickness measurement, absolute refractive index and extinction coefficient of N K. design of multi angle the nano thin film. Characteristic： 1. nanometer order of high sensitivity The sampling method of international advanced, the core device with high stability, quality manufacturing and implementation to ensure the measurement of thin films, film thickness accuracy can reach 0.2nm. 2. 1.6 seconds of rapid measurement International standard instrument design, to ensure the accuracy and accuracy at the same time, can quickly complete a measurement in 1.6 seconds, can be measured on the nano film growth process. 3. simple and convenient operation of the instrument Users only need a button to complete the complex material measurement and analysis process, a key export. Rich model library, material library to facilitate the user to carry out advanced measurement settings. Application: EM12 is suitable for the research and development of new products in the industrial environment or quality control. EM12 can be used to measure the monolayer or multilayer nano film layer structure sample film thickness, refractive index and extinction coefficient of N K; can be used for simultaneous measurement of refractive index of bulk material ratio n and extinction coefficient K; can be used for real-time measurement of the rapid change of the nano film thickness, refractive index and extinction coefficient of K. n Including the field of nano film EM12 can be used: microelectronics, semiconductor, integrated circuit, display technology, solar cells, optical film, life science, chemistry, electrochemistry, magnetic storage, flat panel display, polymer and metal surface treatment. Bulk materials can be applied to the domain includes: solid (metal, semiconductor, media, etc.), (or liquid pure substance or mixture). Technical index: Instrument model:EM12 Laser wavelength: 632.8nm (Laser He-Ne) Repeatability of film thickness measurement: 0.2nm (for planar Si substrate SiO2 100nm film) Refractive index measurement repeatability: 2x10-3 (for planar Si substrate SiO2 100nm film) Single measurement time: Related to measurement setup, typical 1.6s Maximum film range: The transparent film can reach 4000nm, and the absorption film is related to the properties of the material. Optical structure: PSCA (delta also has a very high near 0 degrees or 180 degrees of accuracy) Laser beam diameter: 1-2mm Angle of incidence: 40 degrees -90 degrees can be manually adjusted, step by step 5 Sample azimuth adjustment: Z axis height adjustment: + 6.5mm Two dimensional pitch adjustment: + 4 Sample alignment: optical self collimation and micro alignment system Sample table size: The plane sample diameter is phi 170mm Maximum outline dimension: 887 x 332 x 552mm (when the incidence angle is 90 degrees) Instrument weight (net weight): 25Kg Optional accessories: Horizontal XY axis adjustment translation table, vacuum adsorption pump
Introduction: EM12 is the extension of measuring technology of advanced technology, sophisticated type for research and development and quality control in the field of precision end needs of the launch of multi angle laser ellipsometer. EM12 can accurately measure the samples in a single incident angle or multi angle. Can be used for film thickness measurement of monolayer or multilayer nano film samples. The refractive index and extinction coefficient of N K; also can be used for simultaneous measurement of refractive index of bulk material ratio n and extinction coefficient K; can be used for real-time measurement of thickness of nanometer thin film growth in dynamic film thickness measurement, absolute refractive index and extinction coefficient of N K. design of multi angle the nano thin film.
