Profile: ES01 is a scientific and industrial environment for the measurement of thin film launched a high-precision full automatic spectroscopic ellipsometry, the range of wavelength range of the instrument cover UV, visible to the infrared ES01 series spectroscopic ellipsometry is used to measure the structural parameters (e.g., thickness, and physical parameters (e.g., refractive index n, extinction coefficient K) of single layer and multilayer nano thin films, and can also be used to measure the refractive index n and extinction coefficient of bulk materials K. ES01 series spectroscopic ellipsometry is suitable for real-time and non real-time detection of samples Characteristic： Detection sensitivity of 1 atomic level International advanced sampling methods, high stability of the core device, high quality design and manufacturing process to achieve and ensure the ability to measure the atomic level of the nano film, film thickness accuracy of 0.05nm. 2 seconds fast measurement Fast ellipsometry sampling method, high signal to noise ratio signal detection, automatic measurement software, to ensure high precision and accuracy of the same time, within 10 seconds to complete a full spectrum ellipsometric measuremen 3 one button operation For conventional operation, just click the mouse button to complete a complex measurement, modeling, fitting and analysis process, a wealth of model library and material library is also convenient for the user's advanced operating requirements Technical index: Spectral range: U:245 - 1000nm UI:245 - 1700nm V:370-1000nm VI:370 - 1700nm NIR:900 - 1700nm NIRX:1000 - 2500nm DIX:193 - 2100 nm other spectral range: customizable Spectral resolution: better than 1.5nm Single measurement time: typical 10s, depending on the measurement mode Accuracy: Delta (Psi): 0.02 degrees, Delta (Delta): 0.04 degrees When the air is measured by transmission mode Repeatability of film thickness measurement: SiO2 film on the surface of Si substrate 100nm Refractive index accuracy: 1x10-3 (for planar Si substrate 100nm on the SiO2 film) Incident angle: 40 degrees -90 degrees automatic adjustment, accuracy is better than 0.02 degrees Optical structure: PSCA (which also has a very high near 0 degrees or 180 degrees of accuracy) The sample size: the maximum size can be placed samples of 8 inch Height adjustment range: 0-10mm Two dimensional pitch adjustment: + 4 Sample alignment: opticalautocollimation microscope and telescope alignment system
Profile: ES01 is a scientific and industrial environment for the measurement of thin film launched a high-precision full automatic spectroscopic ellipsometry, the range of wavelength range of the instrument cover UV, visible to the infrared ES01 series spectroscopic ellipsometry is used to measure the structural parameters (e.g., thickness, and physical parameters (e.g., refractive index n, extinction coefficient K) of single layer and multilayer nano thin films, and can also be used to measure the refractive index n and extinction coefficient of bulk materials K. ES01 series spectroscopic ellipsometry is suitable for real-time and non real-time detection of samples
