1 Sales XC-SP-200 high frequency plasma power supply,Manufacturer
Position: Home > > Industry specific instrument > Other industries special instruments > RF power supply > XC-SP-200 high frequency plasma power supply for Plasma surface treatment

XC-SP-200 high frequency plasma power supply for Plasma surface treatment

Product ID:OtherRFdy027

Price: Please inquire PDF Format
Supply Ability:50 SETS/MON
Port:SHENZHEN
share:
  • Product Introduction
  • Consulting
  • Model NumberXC-SP-200
    Brand NameCHANGCHUNXINGDA
    Payment TermsTT,PAYPAL
    XC-SP-200 high frequency plasma power supply

    Introduction
    The high-frequency plasma power source produced by our factory is widely used in scientific research and industry such as plasma modification, polymerization, analysis, PCVD, vapor deposition, magnetron sputtering film, plasma surface treatment, and low-temperature plasma medical disinfection and sterilization in the vacuum chamber. field. Mainly for domestic universities, colleges, research institutes, vacuum coating, photovoltaic, medical, and optoelectronic high-tech enterprises. And exported abroad. Deeply trusted by the majority of users.
    Our factory takes the customer as the center, providing customers with high-quality, supporting and reliable instruments and perfect service tenet. And continue to develop a series of products such as radio frequency plasma power supply, automatic matching device, DC sputtering power supply, negative pulse power supply, film thickness monitor and so on. Constantly develop, keep making progress, and actively follow the world's advanced technology trends. It can meet the needs of customers as much as possible, and provide comprehensive, high-quality and fast services.
    Technical index:
    Output frequency: 50KHZ
    Output power: 0—1200W
    Output voltage: ~ 0-600V (when connected to the internal resistance of the load)
      Output current: ~2.8A (when connected to the internal resistance of the load)
    Power supply mode: mains 220V
    Cooling method: air cooling
    Efficiency: 75%
      Ambient temperature: -4040
    Relative humidity: <90%
      Dimensions: width 200 height 133 depth 385 mm
    Net weight: 5.8kg
  • Introduction
    The high-frequency plasma power source produced by our factory is widely used in scientific research and industry such as plasma modification, polymerization, analysis, PCVD, vapor deposition, magnetron sputtering film, plasma surface treatment, and low-temperature plasma medical disinfection and sterilization in the vacuum chamber. field. Mainly for domestic universities, colleges, research institutes, vacuum coating, photovoltaic, medical, and optoelectronic high-tech enterprises. And exported abroad. Deeply trusted by the majority of users.
    Our factory takes the customer as the center, providing customers with high-quality, supporting and reliable instruments and perfect service tenet. And continue to develop a series of products such as radio frequency plasma power supply, automatic matching device, DC sputtering power supply, negative pulse power supply, film thickness monitor and so on. Constantly develop, keep making progress, and actively follow the world's advanced technology trends. It can meet the needs of customers as much as possible, and provide comprehensive, high-quality and fast services.
     
Products
Analytical instruments
Physical property test
Environmental monitoring and analysis
Lab general equipment
About us
About this website
Our service
Product purchase
Contact Us

Newsletter

Make Sure you dont miss interesting happenings by joining our newsletter program.

Contact Us
+86-18620722006
instruments@instrumentstrade.com