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WLT-1000W RF power supply for Magnetron sputtering film

Product ID:OtherRFdy014

Price: Please inquire PDF Format
Supply Ability:30 SETS/MONTH
Port:SHENZHEN
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  • Product Introduction
  • Consulting
  • Model NumberWLT-1000W
    Brand NameQES
    Payment TermsT/T, paypal
    Introduction:
    The RF power supply is a plasma supporting power supply. It is composed of an RF power source, an impedance matching device and an impedance power meter. It is an emerging high-tech field in China in the late 1980s. It is used in RF sputtering, PECVD chemical vapor deposition, and reactive ions. In the etching and other equipment, the modern RF power supply has developed rapidly. From the tube power supply in the 1980s, it has gradually developed into the current transistor RF power supply. The power is from watts, watts, kilowatts, to megawatts, and the frequency is 2Mhz/ 13.56Mhz/27.12Mhz/40.68Mhz, etc., and applications have also expanded from the previous vacuum field to other fields, semiconductors, beauty, etc.
    Frequency: 2MHZ, 3MHZ, 7MHZ, 13.56 MHz, 27.12 MHz, 40.68 MHz, 80 MHz, 81.36 MHz, 100 MHz, 150 MHz, 200 MHz (or other frequencies)
    Technical Parameters:
    Power range: 0~1000W continuously adjustable
    Maximum reflection: 300W
    Output impedance: 50 ohms
    Frequency stability: ±0.005%
     Power stability: 1000W ± 0.5%
     Overall efficiency: ≥75% (50Ω load, 50Ω load)
     Frequency signal: standard sine wave
     Output harmonics: second harmonic is less than -55dB
     Signal output mode: continuous; pulse
     Ambient temperature: -40 to 40 ° C
    Relative humidity: < 90%
     Cooling method: forced air cooling
     Input voltage: 220 V/50Hz
    Output connection: N type coaxial connector
    Panel display: digital display
    Protection function: standing wave protection, over temperature protection, DC power supply overcurrent protection
    Size: 483mm (width) * 147mm (height) * 408mm (deep)
     

  • Introduction:
    The RF power supply is a plasma supporting power supply. It is composed of an RF power source, an impedance matching device and an impedance power meter. It is an emerging high-tech field in China in the late 1980s. It is used in RF sputtering, PECVD chemical vapor deposition, and reactive ions. In the etching and other equipment, the modern RF power supply has developed rapidly. From the tube power supply in the 1980s, it has gradually developed into the current transistor RF power supply. The power is from watts, watts, kilowatts, to megawatts, and the frequency is 2Mhz/ 13.56Mhz/27.12Mhz/40.68Mhz, etc., and applications have also expanded from the previous vacuum field to other fields, semiconductors, beauty, etc.
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