Brief introduction VTC-600-2HD double target magnetron sputtering apparatus is the latest development of the development of coating equipment can be used for the preparation of monolayer or multilayer ferroelectric thin film, conductive film and alloy film, semiconductor film, ceramic film, dielectric film, optical film, oxide film, hard film and polytetrafluoroethylene film. Compared with the similar equipment, it is not only widely used, and has the advantages of the volume of urine in operation, is an ideal equipment for the preparation of materials laboratory equipment. Features 1, two target rifle, a weak magnetic target for non conductive target sputtering, a strong magnetic target for ferromagnetic material sputtering. 2, can make a variety of thin films, widely used. 3, small size, easy to operate. Technical parameters 1, the power supply voltage: 220V 50Hz 2, total power: 2KW 3, limit vacuum: (E-6mbar < equipment with the company to use E-5mbar) 4, working temperature: room temperature -500 degrees, the accuracy of + 1 C (according to the actual need to enhance the temperature) 5, the number of target guns: 2 (optional with a number of other) 6, target gun cooling: water cooling 7, the target size: 2 "diameter, the thickness of 0.1-5mm (due to different target materials with different thickness) 8, DC sputtering power: 500W (optional) 9, RF sputtering power: 300W/500W (optional) 10, the sample carrying station: 140mm 11, sample table speed: 1-20rpm adjustable 12, the protection of gas: Ar, N2 and other inert gases 13, intake air path: mass flow control 2 intake, each flow is 100SCCM
VTC-600-2HD double target magnetron sputtering apparatus is the latest development of the development of coating equipment can be used for the preparation of monolayer or multilayer ferroelectric thin film, conductive film and alloy film, semiconductor film, ceramic film, dielectric film, optical film, oxide film, hard film and polytetrafluoroethylene film. Compared with the similar equipment, it is not only widely used, and has the advantages of the volume of urine in operation, is an ideal equipment for the preparation of materials laboratory equipment.
