Brief introduction: Used in the experiment of surface modification of materials processing, including: cleaning, activation, etching, deposition, grafting and aggregation, etc. Table structure, external vacuum pump. Quartz glass cavity of high strength, easy to clean, corrosion resistance. R way diversification, flat, suspension. Outer ring electrode, effectively avoid the pollution of the cavity in the body. Technical parameters: The machine specification: 500 mm (W) x 500 mm x 310 mm (H) (D) Cavity specifications: Φ 120 mm x 157 mm The cavity volume: 1.8 L Electrode specification: the outer ring electrode Cargo specifications: single, 150 mm x 100 mm (either flat, hanging) Plasma power supply system: solid transistor, placing signage at 40 KHZ Control system: manual control The vacuum system: pumping speed: 3 l/S Pneumatic system: 2 empty working gases, 1 road Working voltage: AC220V
Brief introduction: Used in the experiment of surface modification of materials processing, including: cleaning, activation, etching, deposition, grafting and aggregation, etc. Table structure, external vacuum pump. Quartz glass cavity of high strength, easy to clean, corrosion resistance. R way diversification, flat, suspension. Outer ring electrode, effectively avoid the pollution of the cavity in the body.
