Sales EQ-PCE-6 Medium Plasma Cleaner，Manufacturer

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EQ-PCE-6 Medium Plasma Cleaner for Substrate cleaning

Product ID：SYQ/Xdlz001

Price: Please inquire PDF Format

Supply Ability:50SETS/MON

Port:SHENZHEN

Product Introduction
Consulting

Model NumberEQ-PCE-6

Brand NameYIMA

Payment TermsT/T, paypal

Brief introduction
EQ-PCE-6 is medium plasma cleaner with 6" Dia x 6.5"Length quartz chamber. It is designed to clean and remove nano-scale organic contamination on the substrate or wafer up to 4" using air, oxygen, or argon plasma. The rate of organic removal is about 20 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve the better quality. If you don't have experience for plasma surface cleaning, please refer to the articles as the follows:
1.McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
2.Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
3.Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177
Technical parameters

Input Power	AC 220V, 50/60 Hz, (You may order a transformer to operate at 110V) RF Power: 100 W Max. Vacuum Pump: < 500W Total Power: < 600W
RF Power	RF power (High voltage & high-frequency current applied on the coil) is adjustable at three levels: Low Setting 7.2W; Medium Setting 10.2W; High Setting 30WRF frequency: 13,56 MHz
Control Panel	Control Function: Clean time, RF Power, Vacuum Pump.
Plasma Chamber	6" diameter x 6.5" length quartz chamber3 Liter CapacityHinged type door with viewing window for easy sample loading and observing
Vacuum Pump	One Single Step Rotary Vane Vacuum Pump (220V,187 L/m ) with Exhaust filter and vacuum pipe are included for the equipment (220V).
Inert Gas	Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air and Mixed gas depended on what kind material will be treated. ( not included in the package)No flammable gas shall be used for the plasma cleaner
Optional	Combinations of PCE-6 plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases. Order plasma cleaner with the two-channel gas mixer from product options or Click the picture left for Two Channel Gas Mixer.If use 4" wafer quartz boat, the cleaner can treat 25 pcs 2" Dia wafer per load
Dimensions	400mm L ×300mm W ×300mm H16" x 12" x 12" (inch)
Net Weight	30 Lbs
Shipping Weight & Dimensions	140 lbs40"x30"x23"
Warranty	One year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )
Application Note:	Positive Pressure may damage Plasma Quartz Chamber.

Brief introduction
EQ-PCE-6 is medium plasma cleaner with 6" Dia x 6.5"Length quartz chamber. It is designed to clean and remove nano-scale organic contamination on the substrate or wafer up to 4" using air, oxygen, or argon plasma. The rate of organic removal is about 20 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve the better quality. If you don't have experience for plasma surface cleaning, please refer to the articles as the follows:
1.McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
2.Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
3.Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177