SN-ZK08D-40 Vacuum Plasma Processing Instrument Introduction: Vacuum plasma processing equipment belongs to the dry cleaning of the electronics industry. Under certain vacuum conditions, energy is applied to the gas to make it in a plasma state. The "active" components of the plasma include ions, electrons, atoms, active groups, excited nuclides (metastable states), photons, etc. By utilizing the properties of these active components to treat the surface of the sample, cleaning, coating, and other purposes can be achieved. By using plasma to treat the surface of the sample, the purpose of surface cleaning, surface modification, surface etching, and surface grafting is achieved. Finally, pollutants are converted into gas and discharged through a continuous airflow using a vacuum pump. characteristic: 1. Original powerful power supply: Using original high-voltage excitation power circuit technology, high-density plasma is generated to ensure outstanding cleaning effect. 2. Comprehensive safety protection: temperature safety protection function, overload protection function, short circuit and open circuit alarm protection function, various misoperation protection functions. 3. Unique discharge technology: special treatment and special structure discharge devices ensure the formation of stable and uniform plasma. 4. Excellent sealing vacuum chamber design: High vacuum chamber design and manufacturing process, equipped with a powerful vacuum pump. 5. High quality product components: All components of the product are made of high-quality domestic and foreign parts to ensure superior equipment performance. 7. Ultra low cleaning temperature: meets the temperature requirements of different occasions without affecting the temperature of the cleaning product. 8. Precision CNC machining: Imported exquisite CNC machining technology, equipped with imported coordinate measuring instruments for quality monitoring. 9. Suitable for complex shaped samples: Clean various complex shaped products, including the inner wall of the inner hole, uniformly clean. 10. Customized design: Three frequencies of 40Khz, 13.56MHz, and 2.45GHz can be customized, with customizable electrode quantities and cavity sizes. Technical parameters: Product model: SN-ZK08D-40 Capacity of the cavity: 8L Chamber size (mm): W180 * D260 * H160 Frequency: 40kHz Power: 200W Host size (mm): W415 * D600 * H450 Number of electrode layers: 1 layer Flow meter: 2-channel float flow meter 7-inch touch screen: normal temperature -90 ° C
Introduction: Vacuum plasma processing equipment belongs to the dry cleaning of the electronics industry. Under certain vacuum conditions, energy is applied to the gas to make it in a plasma state. The "active" components of the plasma include ions, electrons, atoms, active groups, excited nuclides (metastable states), photons, etc. By utilizing the properties of these active components to treat the surface of the sample, cleaning, coating, and other purposes can be achieved. By using plasma to treat the surface of the sample, the purpose of surface cleaning, surface modification, surface etching, and surface grafting is achieved. Finally, pollutants are converted into gas and discharged through a continuous airflow using a vacuum pump.
