SD-650MH high vacuum magnetron sputtering instrument Introduction: The high vacuum magnetron sputtering instrument shall be stable, safe and reliable, and easy to operate. It is applicable to the research and preparation of film materials in colleges and research institutes. The high vacuum magnetron sputtering coater is mainly composed of a sputtering vacuum chamber, a magnetron sputtering target, a rotating sample stage, a working gas circuit, an air extraction system, a vacuum measurement and an electric control system. characteristic: 1. It can be placed on the desktop, small and does not take up space 2. The vacuum pumping speed is fast, and it can enter the working state after 10 minutes. 3. There are several spare standard interfaces on the vacuum chamber, which is convenient for teachers to carry out other experimental research and access equipment. Later, RF sputtering system can be directly equipped, which is convenient for teachers to plate semiconductor and other materials later. 4. The electric control locking system prevents the wrong operation of irrelevant persons. 5. Sputtering timing protection device to prevent sample damage caused by too long sputtering time. 6. The substrate temperature is low, and the coating can be completed on non temperature resistant materials. 7. A gold target with a thickness of no less than 0.2mm shall be provided to facilitate the direct use of products upon arrival. 8. The sample table adopts the rotary sample table. Diameter size is optional, and the maximum size cannot exceed φ 150mm。 9. The target is cooled by the self circulating cooling water machine to ensure its life. Technical parameters: Product volume: 610mm long × Width 420mm × The height is 220mm (note: the total height of the cavity is 490mm). Vacuum chamber: diameter 260mm × 270mm high Pumping speed of front stage mechanical pump: 4L/s Pumping speed of the rear stage turbo molecular pump: 300L/s. Limit vacuum degree: 5 × 10-5Pa。 Power supply: input voltage is 220V, output voltage is 0-600v, output current is 0-1.6A, Deposition rate: 0-200nm/min. Sputtering magnetron head diameter: 50mm
Introduction: The high vacuum magnetron sputtering instrument shall be stable, safe and reliable, and easy to operate. It is applicable to the research and preparation of film materials in colleges and research institutes. The high vacuum magnetron sputtering coater is mainly composed of a sputtering vacuum chamber, a magnetron sputtering target, a rotating sample stage, a working gas circuit, an air extraction system, a vacuum measurement and an electric control system.
