Introduction: SD-160 ion sputtering instrument is an ion sputtering coating equipment designed by the principle of secondary (DC) direct current sputtering. Two-pole (DC) direct current sputtering is one of the simplest, reliable and economical coating technology, and it is the basis of ion sputtering instruments provided by many manufacturers. In addition to the usual basic structure, it is characterized by: equipped with a sample splash chamber, a vacuum display meter, a sputter current indicator, a sputter current adjustment controller, a miniature vacuum valve, and a timer. It is easy to control the pressure of the vacuum chamber, ionization current and select the required ionization gas by combining the internal automatic control circuit when working to obtain the best coating effect. The specially designed rubber sealing ring on the edge of the bell can ensure that the glass bell is not "collapsed" that affects the vacuum of the sample sputtering chamber for long-term use; the ceramic seal high-pressure head is more durable than the usual rubber seal. According to the gas ionization characteristics in the electric field, the large-capacity sample sputtering vacuum chamber and the corresponding area sputtering target are used to make the sputtering coating more uniform and clean. In addition, SD-160 uses high-stability, high-sensitivity solenoid valves and a dual-air automatic control system, which makes it easier to protect samples and ensure the quality of sample film formation. It is especially suitable for the preparation of SEM samples in the electron microscope laboratory and the production of electrodes for the research of new materials. Equipped with high-position qualitative Feiyue vacuum pump use: 1. Electron beam sensitive samples Mainly include biological samples, plastic samples, etc. The electron beam in S EM has high energy. During the interaction with the sample, it transfers part of the energy to the sample in the form of heat. If the sample is a material sensitive to electron beams, this interaction will destroy part or even the entire sample structure. In this case, a surface coating made of a non-electron beam sensitive material can act as a protective layer to prevent such damage; 2. Non-conductive samples Since the sample does not conduct electricity, its surface has "electron traps". This accumulation of electrons on the surface is called "charging". In order to eliminate the charging effect, a metal conductive layer can be plated on the surface of the sample. The coating acts as a conductive channel to transfer the charged electrons from the surface of the material to eliminate the charging effect. In scanning electron microscopy imaging, sputtering materials increase the signal-to-noise ratio, thereby obtaining better imaging quality. 3. New materials Fabrication of experimental electrodes of non-conductive materials to observe conductive characteristics Technical Parameters: Sputtering gas: Argon, nitrogen and other gases can be added according to the purpose of the experiment. Sputtering target: The standard target is a gold target with a thickness of 50mm*0.1mm. It can also be equipped with silver target and platinum target according to the actual situation. The evaporation material is carbon rope. Sputtering current: maximum current 50mA, maximum working current 30mA Sputtering rate: better than 4nm/min Sample bin size: diameter 160mm, height 120mm Sample stage size: The sample stage size can be installed with a sample stage with a diameter of 50mm and a diameter of 70mm, and the height of the sample stage can be adjusted. The sample table can also be customized according to your own requirements Working voltage 220V (110V can be used), 50HZ
Introduction: SD-160 ion sputtering instrument is an ion sputtering coating equipment designed by the principle of secondary (DC) direct current sputtering. Two-pole (DC) direct current sputtering is one of the simplest, reliable and economical coating technology, and it is the basis of ion sputtering instruments provided by many manufacturers. In addition to the usual basic structure, it is characterized by: equipped with a sample splash chamber, a vacuum display meter, a sputter current indicator, a sputter current adjustment controller, a miniature vacuum valve, and a timer. It is easy to control the pressure of the vacuum chamber, ionization current and select the required ionization gas by combining the internal automatic control circuit when working to obtain the best coating effect. The specially designed rubber sealing ring on the edge of the bell can ensure that the glass bell is not "collapsed" that affects the vacuum of the sample sputtering chamber for long-term use; the ceramic seal high-pressure head is more durable than the usual rubber seal. According to the gas ionization characteristics in the electric field, the large-capacity sample sputtering vacuum chamber and the corresponding area sputtering target are used to make the sputtering coating more uniform and clean. In addition, SD-160 uses high-stability, high-sensitivity solenoid valves and a dual-air automatic control system, which makes it easier to protect samples and ensure the quality of sample film formation. It is especially suitable for the preparation of SEM samples in the electron microscope laboratory and the production of electrodes for the research of new materials. Equipped with high-position qualitative Feiyue vacuum pump
