Brief introduction:
Plasma rf power is the auxiliary power supply used in rf sputtering, PECVD chemical vapor deposition technique, the reactive ion etch, and other equipment. Products of our company core parts adopt international famous company high-quality rf devices, ensures that our company all-solid-state rf power supply series products with high quality and reliable, long life of sex, can be used 24 hours of continuous work, more than 30 years); Frequency stability has reached the international advanced level. Excellent core component, the unique processing technology, perfect quality assurance system, to create our high quality products, and won the domestic many scientific research units and equipment manufacturers. Technical indicators
Total rated output power: 500 w, 1000 w, 2000 w
Output power: 5 ~ 100%, continuous adjustable; One single channel power rating to one half the total rated power
Power deviation: two way power relative deviation of 1% or less (under the condition of each way are good match)
Power stability: plus or minus 0.5% or less
Frequency stability: plus or minus 0.005% or less
The maximum output power margin: about 10%
Rated output power response time: start < 10 ms
Vibration frequency signal: standard sine wave, the import semiconductor incentives
Signal frequency: 13.56 MHz and 27.12 MHz and 13.56 MHz and 81.36 MHz, 100 MHz, and other custom frequencies
Signal output form: continuous wave; Additive pulse modulation, square wave, pulse width 10 microseconds to continuous wave, duty ratio can be user defined, along the square wave rising or falling time is not more than 3 microseconds
Phase shifting range: two lines of the output phase 0 ~ 180 ° is adjustable
Output impedance: 50 Ω
Pattern under standing wave ratio, VSWR 2.0 or less
Harmonic output: second harmonic below - 50 db, three times and higher harmonic below - 55 db
The noise output: below - 50 db
Cooling: air cooling
Power supply voltage: AC220V plus or minus 15%, 50 hz / 60 hz
Ambient temperature: 0 ~ 40 ℃
Relative humidity: < 85%
Communication interface: 15 needle type D interface
Output interface: standard output coaxial connectors, N type, negative
Long life: import transistor core parts, work 24 hours a day can be used for 30 years.
Brief introduction:
Plasma rf power is the auxiliary power supply used in rf sputtering, PECVD chemical vapor deposition technique, the reactive ion etch, and other equipment. Products of our company core parts adopt international famous company high-quality rf devices, ensures that our company all-solid-state rf power supply series products with high quality and reliable, long life of sex, can be used 24 hours of continuous work, more than 30 years); Frequency stability has reached the international advanced level. Excellent core component, the unique processing technology, perfect quality assurance system, to create our high quality products, and won the domestic many scientific research units and equipment manufacturers.
