Introduction: The PCE-8 plasma cleaner is a larger plasma cleaner with a plasma chamber of Ø8.5" x 12" quartz cavity. The RF power supply is 0-100W continuously adjustable. The RF frequency is 13.56MHz. . This machine mainly removes the oxide layer and contaminants on the substrate by plasma of air, oxygen or argon gas, and also changes the surface properties of the object (such as hydrophilicity and hydrophobicity) for cleaning the substrate. And film processing is an ideal device. Pretreatment of the epitaxial film of single crystal material prior to its growth will have a significant effect on growth. The PCE-8 plasma cleaner is equipped with a direct-connected double-screw vacuum pump that can evacuate the chamber and pass a protective gas such as argon. It is suitable for cleaning easily oxidizable articles. Features: 1, using 6" color touch screen, can control RF power, cleaning time, gas flow, vacuum pump opening. 2. The internal mass flow meter with 0-500mm/min can accurately control the intake air flow. Technical Parameters: 1, power: AC220V 2, RF power: up to 100W, can be adjusted between 0-100W 3, vacuum pump power: <500W 4, the total power: <600W 5, RF: 13.56MHz 6. Plasma chamber: high-purity quartz cavity, outer diameter Ø8.5", inner diameter Ø8.2", length 12", vacuum sealing with aluminum folding flange, flange with Ø60mm observation window 7, the ultimate vacuum: 50mtorr 8, the introduction of gas: can pass a variety of gases, such as N2, Ar, Air, H2, O2 and mixed gases, etc. (depending on the nature of the material) Size: 620mm × 450mm × 600mm Standard accessories: 1. Direct-connected double-screw vacuum pump (240L/min) 2, KF25 bellows 3, KF25 manual flapper valve Optional accessories 1, 300W, 600W RF power supply (for plasma etching and plasma ashing experiments) 2, 2"-6" quartz boat (with substrate) 3, 2-4 channel float mixing system 4, 2-4 channel proton mixing system
The machine mainly uses air, oxygen or argon plasma to remove oxide layers and pollutants on the substrate, and change the surface properties of objects (such as hydrophilicity and hydrophobicity) to clean the substrate.
