Introduction ETD - 2000 - c sputtering steamed carbon instrument is based on diode (DC) DC sputtering principle design, the most simple, reliable and economical coating equipment. At the same time increased the thermal evaporation attachments, sputtering and evaporation two functions. Meet the electron microscopy laboratory, scanning electron microscope (SEM) and nonconductive material experiment electrode production sample preparation. Features In ETD-2000/3000 on the basis of ion sputtering apparatus , an increase of thermal evaporation attachments, can evaporate carbon filament has two functions sputtering and evaporation . Thus extends the scope of application , especially for the preparation of laboratory samples in a scanning electron microscope . Technical parameters: Instrument size: 400 mm * 300 mm * 400 mm (L * W * H) Vacuum sample room: boron silicate glass 160 mm x 110 mm x H (D) Target (upper electrode) : 50 mm x 0.1 mm (D * H) Sample machine: 50 mm (D) Operating vacuum: 4 mbar to 2 x 10 x 10-1-2 mbar Working voltage: 0-1600 - v (DC) is adjustable Sputtering current: 0 to 50 ma sputtering time: 1-9999 - s Steamed current 0 to 10 a carbon (AC) Vacuum pump: 4 litres of two-stage mechanical rotary pump (limit vacuum 2 x 10-2 mbar)
Introduction ETD - 2000 - c sputtering steamed carbon instrument is based on diode (DC) DC sputtering principle design, the most simple, reliable and economical coating equipment. At the same time increased the thermal evaporation attachments, sputtering and evaporation two functions. Meet the electron microscopy laboratory, scanning electron microscope (SEM) and nonconductive material experiment electrode production sample preparation.
