CPV-G CIF plasma vaporization grafting instrument Introduction: The CIF Plasma Vaporization Grafting Instrument (CPV-G) is a supporting equipment for plasma surface treatment equipment. It is mainly used to vaporize liquid raw materials and input them into the reaction chamber of the plasma surface treatment instrument at a certain flow rate for material surface grafting and deposition. It is suitable for various ion treatment equipment. Features: 1. Detachable sample heating chamber and gas mixing chamber for easy cleaning and replacement of different liquid samples. 2. The gas mixing chamber is made of polytetrafluoroPTFE material, which has good inertness, acid and alkali resistance, and good insulation performance. 3. The pipeline insulation heating system can ensure that the vaporized gas will not condense and maintain smooth ventilation. 4. The sample heating chamber and pipeline are easy to clean, and can automatically clean various sample residues in the pipeline. 5. Three way gas design, more in line with process requirements. One path of gas enters the heating chamber, one path of gas enters the gas mixing chamber, and one path of grafting gas. 6. Dual flow meter design for accurate control. Technical parameters: Sample tank size: Φ 95 x 105mm Sample tank volume: 250ml PTFE gas mixing chamber volume: 30ml Temperature control range: RT-150 ° C Flow control: dual flow valve control, 0-10L/min Pipeline system: 2-way intake and 1-way outlet Power supply: 220V/50/60Hz/200W Machine size: 30cm (W) x 20cm (D) x 24cm (H).
Introduction: The CIF Plasma Vaporization Grafting Instrument (CPV-G) is a supporting equipment for plasma surface treatment equipment. It is mainly used to vaporize liquid raw materials and input them into the reaction chamber of the plasma surface treatment instrument at a certain flow rate for material surface grafting and deposition. It is suitable for various ion treatment equipment.
