CPC-F plasma cleaning machine Introduction: Plasma cleaning equipment is widely used in materials science, microelectronics, semiconductors, circuit boards, LEDs, microfluidics, optoelectronic solar energy, biomedical and other fields, mainly for cleaning, modifying, etching and other purposes on material surfaces. Features: 1. 7-inch color touch screen with interactive operation interface in both Chinese and English, automatic control and monitoring of process parameter status, 20 formula programs, and process data that can be stored and traced. 2. PLC controls the entire cleaning process, with two working modes: manual and automatic. 3. Using the American Dwyer gas float flowmeter or mass flowmeter (CPC-FM), it can input gases such as oxygen, argon, nitrogen, hydrogen, or mixed gas for accurate gas control. 4. Gas backfilling and blowing, HEPA efficient filtration to prevent secondary pollution. 5. 316 stainless steel and quartz vacuum chambers are optional, and the full vacuum pipeline system uses 316 stainless steel material, which is corrosion-resistant and pollution-free. 6. Designed with a 60 degree tilt angle control panel, it conforms to ergonomics, is easy to operate, and has a user-friendly interface. 7. The upper control and lower cabin structure design is compact and occupies a small space. 8. The concave front panel design effectively protects the flow meter and cabin door from damage. 9. Fast, efficient and uniform processing, pollution-free, and good process repeatability. 10. The sample processing temperature is low, with no thermal damage or oxidation. 11. Safety protection, cabin door open, automatic power off. Technical parameters: RF power supply: 40KHz RF power: 0-600W Matchmaker: Automatic Matchmaker Excitation method: capacitive or inductively coupled (ICP) Gas control: dual float flowmeter Cabin size: D200x Φ 155mm Cabin material: stainless steel or quartz glass Cabin volume: 3.8L-5L Effective processing size: L200xW155mm Time setting: 9999 seconds Vacuum pump: pumping speed of 4m ³/ H Gas stabilization time: 1 minute Vacuum degree: within 100pa Power supply: AC220V 50/60Hz 766/316W Product size: L440xW410xH455mm Packaging size: L560xW560xH685mm Total weight: 32kg
Introduction: Plasma cleaning equipment is widely used in materials science, microelectronics, semiconductors, circuit boards, LEDs, microfluidics, optoelectronic solar energy, biomedical and other fields, mainly for cleaning, modifying, etching and other purposes on material surfaces.
