CPC-10 series pilot plasma cleaning machine Introduction: The all-new CPC-10 series laboratory type plasma cleaning equipment subverts the traditional design concept of plasma cleaning equipment. It has a large cavity size and effective sample processing area, low operating cost, high cost-effectiveness, fast and efficient processing, and is particularly suitable for small batch pilot production in universities, research institutes, and optoelectronic enterprise laboratories. Features: 1. 7-inch color touch screen with interactive operation interface in both Chinese and English, automatic control and monitoring of process parameter status, 20 formula programs, and process data that can be stored and traced. 2. The PLC industrial computer controls the entire cleaning process, with two working modes: manual and automatic. 3. The quartz vacuum chamber and vacuum pipeline system are made of 316 stainless steel material, which is corrosion-resistant and pollution-free. 4. Using a mass flow meter to achieve precise control of gas input, changing the problem of inaccurate gas flow control in traditional float flow meters. 5. HEPA efficient filtration, gas backfilling and blowing to prevent secondary pollution. 6. The 60 degree tilt operation interface design is in line with ergonomics, convenient to operate, and user-friendly. 7. Top mounted vacuum chamber, with an upper cover design and a downward pressure hinge opening and closing method, making the opening and closing of the cover convenient. 8. Adopting a showerhead type porous air intake method to change the problem of uneven single hole air intake in traditional plasma cleaning machines. 9. The design of an upper mounted 360 degree free horizontal sample tray conforms to ergonomics and is more convenient to operate. 10. It has a large effective cleaning area and can clean silicon wafers with a maximum diameter of 8 inches. 11. Safety protection, cabin door open, automatic power off. Technical parameters: Model: CPC-10 RF power supply: 40KHz RF power: 0-600W Matcher: automatic matching Excitation method: capacitive Gas control: dual float flowmeter Cabin size: L300x Φ 215mm Cabin volume: 10.8L Cabin material: stainless steel Effective processing size: L300xW215mm Time setting: 9999 seconds Gas stabilization time: 1 minute Vacuum degree: within 100pa Power supply: AC220V 50/60Hz 766/466W Product size: L645xW550xH495mm Packaging size: L750xW700xH720mm Total weight: 55kg
Introduction: The all-new CPC-10 series laboratory type plasma cleaning equipment subverts the traditional design concept of plasma cleaning equipment. It has a large cavity size and effective sample processing area, low operating cost, high cost-effectiveness, fast and efficient processing, and is particularly suitable for small batch pilot production in universities, research institutes, and optoelectronic enterprise laboratories.
