XAVU non-destructive zoom spectrometer Introduction: XAVU is a versatile spectrometer that utilizes advanced EFP algorithm and low light concentration technology. It retains the film thickness performance of a dedicated thickness gauge for detecting small samples and grooves, while also meeting the requirements of component analysis. Widely used for quality control of various products, incoming material inspection, and measurement of production process control. Features: 1. Micro focusing enhanced X-ray generator and advanced optical path conversion focusing system, with a measurement area as small as 0.03mm2 2. Equipped with non-destructive zoom detection technology and manual zoom function, it can perform non-destructive testing on various irregular groove parts, with a groove depth range of 0-30mm 3. Core EFP algorithm, which can quickly, accurately, and stably perform data analysis on multiple layers and elements, including the same element in different layers (Ni/Cu/Ni/FeNdb on neodymium iron boron magnets, accurately detecting the thickness of one and three layers of Ni) 4. Configure an intelligent vacuum pumping system to shield the influence of the atmosphere on low-energy elements. The coating thickness and composition testing accuracy of light elements such as Al, Si, and P are higher, and the data is more accurate and stable 5. Assemble SDD silicon drift detector with higher resolution, good energy linearity, and higher peak to back ratio 6. Configure more efficient digital multi-channel technology, with faster testing speed and a counting rate of 100000CPS, resulting in higher accuracy 7. Analysis range of coating: Lithium Li (3) - Uranium U (92) 8. Scope of composition analysis: Sodium Na (11) - Uranium U (92) 9. RoHS and halogen harmful element detection 10. Humanized closed software that automatically judges fault prompts, corrects and operates steps to avoid misoperation 11. Standard 4 collimators with automatic switching, measuring an area as small as 0.03mm2 12. Equipped with low light concentration technology, the diffusion degree of the nearest ranging spot is less than 10% Technical parameters: RoHS analysis: detection of harmful elements RoHS (Pb, HgCdCB, Cl) Coating analysis: It can simultaneously analyze 23 coatings and 24 elements, and different layers with phase elements can also be analyzed. It can detect 90 elements of Li (3) U (92) coatings using an intelligent vacuum system, which has higher accuracy and stability in testing the thickness of light element coatings such as Al, Si, and P. Composition analysis: used for 80 elements of Na (11) - U (92) in minerals, alloys, and precious metals Software operation: Humanized closed software, automatic fault diagnosis, prompt correction, and operation steps to avoid misoperation EFP algorithm: standard configuration Detector: Standard SDD silicon drift detector (optional with large area SD) X-ray device: Microfocus enhanced X-ray tube Analysis time: 1-200 seconds Low light focusing technology: the diffusion degree of the nearest ranging spot is less than 10% Collimator: φ 0.5mm; φ 1.5mm; φ 3mm; φ Automatic switching of 8mm four collimators Filter: Four types of filters automatically switch Sample observation: 127 "color C0D with zoom function Measurement distance: With distance compensation function, the measurement distance can be changed for irregular samples with concave and convex shapes, and the zoom distance can reach 0-30mm Focusing method: High sensitivity lens, manual focusing Magnification factor: optical 38-46X, digital amplification 40-200 times Instrument size: 470mm * 550mm * 370mm Vacuum system: Intelligent sealed vacuum system (optional super large vacuum chamber)
Introduction: XAVU is a versatile spectrometer that utilizes advanced EFP algorithm and low light concentration technology. It retains the film thickness performance of a dedicated thickness gauge for detecting small samples and grooves, while also meeting the requirements of component analysis. Widely used for quality control of various products, incoming material inspection, and measurement of production process control.
