VTC-600-3HD Three Target Magnetron Sputtering Device Introduction:
VTC-600-3HD three-target magnetron sputtering device is the latest research and development of coating equipment, can be used to prepare single or multi-layer ferroelectric thin film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, Oxide film, hard film, PTFE film, etc. Compared with similar devices, it not only has a wide range of applications, but also has the advantages of small size and easy operation. It is an ideal device for preparing thin films of materials in laboratories, and is particularly suitable for laboratory research on solid electrolytes and OLEDs. Features:
1. Three target guns, one supporting RF power supply for sputter coating of non-conductive targets, and two matched DC power supplies for sputtering of conductive materials
Coating (target gun can be arbitrarily exchanged according to customer needs).
2, can prepare a variety of films, widely used.
3, small size, easy to operate.
4, the modular design of the whole machine, vacuum chamber, vacuum pump group, control power split design, according to the actual needs of users to adjust the purchase needs.
5, according to the actual needs of the user to select the power supply, a power supply can control multiple target guns, multiple power supply can also be a single control target gun. Technical Parameters:
1, the power supply voltage: 220V 50Hz
2, the total power: 2.5KW
3, ultimate vacuum degree:< E-6mbar (with the company's equipment can reach E-5mbar)
4, working temperature: RT-500 °C, precision ± 1 °C (can increase the temperature according to actual needs)
5, the number of target guns: 3
6, target gun cooling method: water cooling
7, target size: Ø2′′, thickness 0.1mm-5mm (different thickness due to the target material material)
8, DC sputtering power: 500W (optional)
9, RF sputtering power: 300W/500W (optional)
10. Loading sample stage: Ø140mm
11, sample speed: 1rpm-20rpm adjustable
12, protective gas: Ar, N2 and other inert gases
13, intake air: mass flowmeter control 2 intake, each flow is 100SCCM
Introduction:
VTC-600-3HD three-target magnetron sputtering device is the latest research and development of coating equipment, can be used to prepare single or multi-layer ferroelectric thin film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, Oxide film, hard film, PTFE film, etc. Compared with similar devices, it not only has a wide range of applications, but also has the advantages of small size and easy operation. It is an ideal device for preparing thin films of materials in laboratories, and is particularly suitable for laboratory research on solid electrolytes and OLEDs.
