Introduction: The growing nanowire CVD furnace OTF-1200X-4-NW is a compact CVD furnace designed specifically for the growth of various nanowires. The substrate has a maximum of 3′′. A small heater is mounted on the left side of the flange. Preheating the input gas, liquid, and solids into a CVD furnace for nanowire growth, and its slideable sample holder makes operation easier. Features: 1. A compact CVD furnace evolved from the OTF-1200X-4 Single Temperature Zone Furnace. 2. The surface of the inner furnace is coated with imported high-temperature alumina coating, which can increase the heating efficiency of the equipment and extend the service life of the equipment. 3, the right flange with the sample holder is sliding, to facilitate the rapid sampling of the sample. 4. The small heater on the left can preheat the gas, liquid, solid or mixture input to the CVD furnace. The stainless steel heating chamber has an outer diameter of Ø30mm, a length of 150mm, and a maximum working temperature of 600°C. 5. The left flange (between the heater and the CVD oven) is equipped with four 1/4" sleeves connected to the vent pipe, which has the function of sealing and gas passage. 6, PID self-tuning digital controller, you can set 30 paragraphs of heating and cooling procedures. 7, Optional software can be used to control the temperature of the computer. 8, has passed CE certification. Technical Parameters: Rated voltage: single-phase AC 220V 50Hz/60Hz Rated power: 3KW (20A air switch required) Quartz tube: outer diameter Ø110mm, inner diameter Ø102mm, length 381mm Heating area: CVD furnace 400mm, heater 150mm, Operating temperature: CVD furnace up to 1100 °C (<2h), continuous operation 200 °C -1000 °C, maximum temperature and cooling rate of 10 °C/min; heater continuous operation 0-500 °C, maximum cooling rate 10 °C/min Temperature control accuracy: ±1°C Thermocouple: Type K Right flange: A 3" quartz sample holder, integrated with quartz baffle and flange, with KF25 vacuum quick connection and water-cooled connection (optional water cooler to avoid O-ring melt) Left flange: There are 2 independent 1/4′′ ports, any gas can be fed into the furnace separately, one 1/4” port will pass the preheated gas into the CVD furnace, one 1/4′′ port will not heat the gas Pass into the furnace and join the heating gas through the T-shaped structure inside the furnace Size: 1200mm × 450mm × 510mm; Weight: 100kg Installation conditions This equipment is required to be used at altitudes below 1000m, temperature 25°C±15°C, and humidity 55%Rh±10%Rh. 1. Water: The equipment is equipped with a self-circulating cooling water machine (filled with purified water or deionized water) 2, electricity: AC380V 50Hz (63A air switch), must have a good grounding 3. Gas: Argon gas (99.99% or more purity) must be filled in the chamber of the equipment. It is necessary to prepare an argon gas cylinder (with a Ø6mm double-jacketed fitting). 4、Workbench: Size 1500mm×600mm×700mm, load-bearing more than 200kg 5, ventilation device: need
Introduction: The growing nanowire CVD furnace OTF-1200X-4-NW is a compact CVD furnace designed specifically for the growth of various nanowires. The substrate has a maximum of 3′′. A small heater is mounted on the left side of the flange. Preheating the input gas, liquid, and solids into a CVD furnace for nanowire growth, and its slideable sample holder makes operation easier.
